DocumentCode :
1356102
Title :
Mechanisms of hydrogen-induced losses in silica-based optical fibers
Author :
Iino, Akira ; Kuwabara, Masahide ; Kokura, Kunio
Author_Institution :
Furukawa Electr. Co. Ltd., Chiba, Japan
Volume :
8
Issue :
11
fYear :
1990
fDate :
11/1/1990 12:00:00 AM
Firstpage :
1675
Lastpage :
1679
Abstract :
The mechanisms of hydrogen-induced losses in silica-based fibers due to reaction are analyzed, and novel experimental results are presented. The mechanisms of hydrogen reaction with a glass structure were studied and found to be divided into two groups. One was responsible for the reaction with glass networks, not defect centers, by which the increases of the short-wavelength loss edge (SLE), hydroxyl group (OH), and long-wavelength loss edge (LLE) were caused at elevated temperature. It is proposed that the second group is the reaction with diamagnetic defect centers (≡Si:), which are induced by the drawing process and cause excess absorption at 0.63 μm. The room-temperature reaction causes the growth of OH and the generation of an absorption peak near 1.52 μm
Keywords :
environmental degradation; glass structure; optical fibres; optical glass; optical losses; silicon compounds; H induced losses; H reaction; SiO2 based optical fibers; absorption; absorption peak; diamagnetic defect centers; drawing process; elevated temperature; glass networks; hydroxyl group; long-wavelength loss edge; room-temperature reaction; short-wavelength loss edge; Absorption; Glass; Hydrogen; Optical fiber cables; Optical fiber losses; Optical fibers; Optical losses; Paramagnetic materials; Paramagnetic resonance; Temperature;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/50.60564
Filename :
60564
Link To Document :
بازگشت