Mechanisms of hydrogen-induced losses in silica-based optical fibers

Author

Iino, Akira ; Kuwabara, Masahide ; Kokura, Kunio

Author_Institution

Furukawa Electr. Co. Ltd., Chiba, Japan

Volume

8

Issue

11

fYear

1990

fDate

11/1/1990 12:00:00 AM

Firstpage

1675

Lastpage

1679

Abstract

The mechanisms of hydrogen-induced losses in silica-based fibers due to reaction are analyzed, and novel experimental results are presented. The mechanisms of hydrogen reaction with a glass structure were studied and found to be divided into two groups. One was responsible for the reaction with glass networks, not defect centers, by which the increases of the short-wavelength loss edge (SLE), hydroxyl group (OH), and long-wavelength loss edge (LLE) were caused at elevated temperature. It is proposed that the second group is the reaction with diamagnetic defect centers (≡Si:), which are induced by the drawing process and cause excess absorption at 0.63 μm. The room-temperature reaction causes the growth of OH and the generation of an absorption peak near 1.52 μm

Keywords

environmental degradation; glass structure; optical fibres; optical glass; optical losses; silicon compounds; H induced losses; H reaction; SiO₂ based optical fibers; absorption; absorption peak; diamagnetic defect centers; drawing process; elevated temperature; glass networks; hydroxyl group; long-wavelength loss edge; room-temperature reaction; short-wavelength loss edge; Absorption; Glass; Hydrogen; Optical fiber cables; Optical fiber losses; Optical fibers; Optical losses; Paramagnetic materials; Paramagnetic resonance; Temperature;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.60564

Filename

60564