DocumentCode
1356379
Title
EUV´s Underdog Light Source Will Have Its Day [Update]
Author
Adee, Sally
Volume
47
Issue
11
fYear
2010
fDate
11/1/2010 12:00:00 AM
Firstpage
13
Lastpage
14
Abstract
A new plasma source may outshine contenders for the next chip lithography technique.
fLanguage
English
Journal_Title
Spectrum, IEEE
Publisher
ieee
ISSN
0018-9235
Type
jour
DOI
10.1109/MSPEC.2010.5605875
Filename
5605875
Link To Document