• DocumentCode
    1357424
  • Title

    Electromechanical Behavior of Carbon Nanotube Turfs Under Torsion

  • Author

    Wu, Tsung-Cho ; Chang, Shuo-Hung

  • Author_Institution
    Dept. of Mech. Eng., Nat. Taiwan Univ., Taipei, Taiwan
  • Volume
    9
  • Issue
    4
  • fYear
    2010
  • fDate
    7/1/2010 12:00:00 AM
  • Firstpage
    513
  • Lastpage
    517
  • Abstract
    This paper describes the electromechanical behavior of carbon nanotube (CNT) turfs when a torque is applied. High aspect ratio (~3.83) cylindrical CNT turfs were grown by a three-zone temperature chemical vapor deposition (TZT-CVD). A distinctive apparatus is developed to apply a torque on the CNT turf and measure the torsional angle simultaneously. Electrical resistance of CNT turf can be recorded during the torsional process. From the experimental results, wrinkles are observed on the exterior of CNT turfs when a torque is applied. The electrical resistance will rise with the increasing shear strain and will rise suddenly after torsional angle of 80°. It indicates that the structure of CNT turf can sustain large shear strain before torsional angle of 80°. In the torsional process, turf structure will go through strain, rupture, and break. Also, the critical buckling angle always occurs at the resistance change exceeding 5%. From the resistance changes, the buckling time and the buckling angle can be forecast. Compared with individual CNT, the CNT turf possesses relatively low critical shear strength of several MPa.
  • Keywords
    buckling; carbon nanotubes; chemical vapour deposition; torsion; CNT turf; buckling time; carbon nanotube turfs; critical buckling angle; electrical resistance; electromechanical behavior; low critical shear strength; shear strain; three-zone temperature chemical vapor deposition; torque; torsional angle; torsional process; turf structure; Buckle; carbon nanotube (CNT) turf; critical shear strength; electrical resistance;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2009.2030680
  • Filename
    5223666