Title :
Physical model of OEIC-compatible lateral current injection lasers
Author :
Sargent, Edward H. ; Tan, Gen-Lin ; Xu, Jimmy M.
Author_Institution :
Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
fDate :
4/1/1997 12:00:00 AM
Abstract :
We employ two-dimensional (2-D) self-consistent physical modeling of a particularly promising lateral current injection laser reported recently in the literature to gain insight into the physical mechanisms governing the operation of this family of devices. We demonstrate the substantial benefits to be obtained from improved hole injection facilitated by relatively light p-type doping of barrier layers; from lateral shifting of the transverse junction to improve the overlap between the photon field and material gain; and from creating a lateral heterobarrier via quantum-well intermixing in order to confine carriers in the lateral direction. We find that with a number of relatively minor physically motivated modifications to existing fabrication processes, lateral injection lasers have the potential to exhibit greatly improved performance characteristics and to realize thereby their tremendous potential as enablers of optoelectronic integrated circuits and novel device structures
Keywords :
carrier density; carrier lifetime; integrated optoelectronics; laser theory; quantum well lasers; semiconductor device models; semiconductor doping; semiconductor lasers; OEIC-compatible lateral current injection lasers; barrier layers; carrier confinement; hole injection; lateral heterobarrier; lateral shifting; material gain; multiple-quantum-well ridge-waveguide transverse junction laser; novel device structures; optoelectronic integrated circuits; performance characteristics; photon field; physical model; quantum-well intermixing; relatively light p-type doping; transverse junction; two-dimensional self-consistent physical modeling; Carrier confinement; Doping; Laser modes; Laser theory; Optical design; Optical device fabrication; Optical materials; Semiconductor lasers; Semiconductor process modeling; Threshold current;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/2944.605701