• DocumentCode
    1359675
  • Title

    Thermodynamic Sensing Mechanisms of AlGaN-Based Metal/Reactive Insulator/Semiconductor-Type Hydrogen Sensors

  • Author

    Lee, Hsin-Ying ; Lee, Ching-Ting

  • Author_Institution
    Dept. of Photonics, Nat. Cheng Kung Univ., Tainan, Taiwan
  • Volume
    12
  • Issue
    5
  • fYear
    2012
  • fDate
    5/1/2012 12:00:00 AM
  • Firstpage
    1450
  • Lastpage
    1454
  • Abstract
    Thermodynamic sensing mechanisms of Pt/reactive insulator/AlGaN hydrogen sensors were studied. The reactive insulator layer of mixed and was grown directly from the AlGaN layer using a photoelectrochemical oxidation method. The current of the hydrogen sensors exhibited considerable response under forward bias in a hydrogen ambient at the temperature range between 350 K and 550 K. Based on the steady-state analysis, the adsorption enthalpy of for hydrogen adsorbed at the interface and in the reactive insulator layer was obtained. Because the kinetic reaction was an exothermic action, the hydrogen response decreased with an increase of operating temperatures. From the thermodynamic kinetic analysis of transient responses, the activation energy was 3.57 kJ/mol. The Pt/reactive insulator/AlGaN hydrogen sensors exhibited high performance at various temperatures.
  • Keywords
    adsorption; aluminium compounds; enthalpy; gallium compounds; gas sensors; insulators; oxidation; photoelectrochemistry; platinum; thermodynamics; transient response; wide band gap semiconductors; Pt-Ga2O3-Al2O3-AlGaN; activation energy; adsorption enthalpy; exothermic action; hydrogen adsorption; hydrogen ambient forward bias; hydrogen sensor; kinetic reaction; photoelectrochemical oxidation method; reactive insulator layer; steady-state analysis; temperature 350 K to 550 K; thermodynamic kinetic analysis; thermodynamic sensing mechanism; transient response; Aluminum gallium nitride; Aluminum oxide; Gallium nitride; Insulators; Oxidation; Temperature sensors; Activation energy; enthalpy; hydrogen sensor; mixed $hbox{Al}_{2} hbox{O} _{3}$ and $hbox{Ga}_{2} hbox{O} _{3}$ reactive insulator; photoelectrochemical oxidation method;
  • fLanguage
    English
  • Journal_Title
    Sensors Journal, IEEE
  • Publisher
    ieee
  • ISSN
    1530-437X
  • Type

    jour

  • DOI
    10.1109/JSEN.2011.2173331
  • Filename
    6059470