• DocumentCode
    1359713
  • Title

    Reflection Properties of Electromagnetic Wave in a Bounded Plasma Slab

  • Author

    Yuan, C.X. ; Zhou, Z.X. ; Sun, H.G.

  • Author_Institution
    Dept. of Phys., Harbin Inst. of Technol., Harbin, China
  • Volume
    38
  • Issue
    12
  • fYear
    2010
  • Firstpage
    3348
  • Lastpage
    3355
  • Abstract
    A bounded plasma stealth model is proposed in this paper. The method of impedance transformation with multiple dielectrics is used to study the propagation properties of electromagnetic (EM) waves in this plasma slab. The relations between the plasma parameters and the reflection which is a combination of the power reflected from the wall-plasma interface, the partial reflections from the bulk plasma, and the collisionally attenuated waves reflected by the conductive plane are derived. In addition, the reflections of the incident wave power dependence on the thickness of plasma are presented for different incident wave frequencies and various plasma parameters. The numerical calculation results show that, due to the presence of the walls, the mechanism of EM-wave attenuation is a combination of the collisional absorption and cavity resonance effects. It is demonstrated that detailed numerical analyses are useful in practical applications pertaining to the control of the reflection of EM waves through a uniform plasma slab covering the conductive plane.
  • Keywords
    electromagnetic wave reflection; plasma boundary layers; plasma dielectric properties; plasma electromagnetic wave propagation; plasma-wall interactions; EM-wave attenuation; bounded plasma slab; bounded plasma stealth model; cavity resonance; collision;]] absorption; collisionally attenuated waves; conductive plane; electromagnetic wave propagation; impedance transformation; multiple dielectrics; wall-plasma interface; Absorption; Attenuation; Electromagnetic scattering; Impedance; Plasmas; Reflection; Slabs; Electromagnetic (EM) wave; impedance; plasma; reflection;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2010.2084110
  • Filename
    5608512