DocumentCode
1359991
Title
Effects of 3H etchant on InSb A and B sides for array fabrication
Author
Daraee, M. ; Moradi, Mehdi ; Hajian, Masood ; Rastgoo, M. ; Forghani, M.A.
Author_Institution
Semicond. Component Ind. (SCI), Tehran, Iran
Volume
45
Issue
18
fYear
2009
Firstpage
957
Lastpage
958
Abstract
The different etching conditions of In face and Sb face of an InSb semiconductor by (HF:H2O2:H2O, 1:1:4) referred to as (3H) for the fabrication of the IR:FPA array based on mesa etching are presented. Results indicate that lateral etching on the Sb face is considerably less than on In face and so is more appropriate for this application.
Keywords
III-V semiconductors; etching; focal planes; indium compounds; infrared detectors; optical fabrication; 3H etchant; IR:FPA array fabrication; InSb; infrared detectors; lateral etching; mesa etching;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2009.0969
Filename
5227011
Link To Document