DocumentCode
1360117
Title
Routing for manufacturability and reliability
Author
Chen, Huang-Yu ; Chang, Yao-Wen
Author_Institution
Grad. Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume
9
Issue
3
fYear
2009
Firstpage
20
Lastpage
31
Abstract
As IC process geometries scale down to the nanometer territory, industry faces severe challenges of manufacturing limitations. To guarantee high yield and reliability, routing for manufacturability and reliability has played a pivotal role in resolution and thus yield enhancement for the imperfect manufacturing process. In this article, we introduce major routing challenges arising from nanometer process, survey key existing techniques for handling the challenges, and provide some future research directions in routing for manufacturability and reliability.
Keywords
integrated circuits; nanotechnology; network routing; reliability; IC process geometry; manufacturability; network routing; reliability; Adaptive optics; Apertures; Chemicals; Etching; Lithography; Manufacturing industries; Manufacturing processes; Optical distortion; Resists; Routing;
fLanguage
English
Journal_Title
Circuits and Systems Magazine, IEEE
Publisher
ieee
ISSN
1531-636X
Type
jour
DOI
10.1109/MCAS.2009.933855
Filename
5227779
Link To Document