DocumentCode
1360809
Title
Analogue delay-locked loop for spatial-phase locking
Author
Goodberlet, J. ; Ferrera, J. ; Smith, H.T.
Author_Institution
Res. Lab. of Electron., MIT, Cambridge, MA, USA
Volume
33
Issue
15
fYear
1997
fDate
7/17/1997 12:00:00 AM
Firstpage
1269
Lastpage
1270
Abstract
An analogue delay-locked loop has been developed for spatial-phase locking in a scanning electron-beam lithography system. The loop improves pattern-placement precision to 3σ≃12 nm, by referencing all writing to a 400 nm-period grating. Results compare well with a numerical simulation
Keywords
analogue circuits; delay circuits; electron beam lithography; analogue delay-locked loop; pattern-placement precision; scanning electron-beam lithography system; spatial-phase locking;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19970858
Filename
606043
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