DocumentCode
1360945
Title
Experimental evidence for quantum mechanical narrow channel effect in ultra-narrow MOSFET´s
Author
Majima, H. ; Ishikuro, H. ; Hiramoto, T.
Author_Institution
Inst. of Ind. Sci., Tokyo Univ., Japan
Volume
21
Issue
8
fYear
2000
Firstpage
396
Lastpage
398
Abstract
The authors describe a new narrow channel effect by quantum mechanical effects in ultra-narrow MOSFET´s. Threshold voltage increase is observed at room temperature in ultra-narrow MOSFET´s whose channel width is less than 10 nm. This result is in excellent agreement with simulation that takes account of quantum confinement in the silicon narrow channel, indicating that the increase in threshold voltage is caused by the quantum mechanical narrow channel effect.
Keywords
MOSFET; silicon-on-insulator; 10 nm; SOI MOSFET; Si; Si narrow channel; quantum confinement; quantum mechanical narrow channel effect; room temperature; threshold voltage increase; ultra-narrow MOSFET; Electrodes; Impurities; MOSFET circuits; Potential well; Quantum mechanics; Resists; Silicon; Temperature; Threshold voltage; Wet etching;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.852962
Filename
852962
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