• DocumentCode
    1360945
  • Title

    Experimental evidence for quantum mechanical narrow channel effect in ultra-narrow MOSFET´s

  • Author

    Majima, H. ; Ishikuro, H. ; Hiramoto, T.

  • Author_Institution
    Inst. of Ind. Sci., Tokyo Univ., Japan
  • Volume
    21
  • Issue
    8
  • fYear
    2000
  • Firstpage
    396
  • Lastpage
    398
  • Abstract
    The authors describe a new narrow channel effect by quantum mechanical effects in ultra-narrow MOSFET´s. Threshold voltage increase is observed at room temperature in ultra-narrow MOSFET´s whose channel width is less than 10 nm. This result is in excellent agreement with simulation that takes account of quantum confinement in the silicon narrow channel, indicating that the increase in threshold voltage is caused by the quantum mechanical narrow channel effect.
  • Keywords
    MOSFET; silicon-on-insulator; 10 nm; SOI MOSFET; Si; Si narrow channel; quantum confinement; quantum mechanical narrow channel effect; room temperature; threshold voltage increase; ultra-narrow MOSFET; Electrodes; Impurities; MOSFET circuits; Potential well; Quantum mechanics; Resists; Silicon; Temperature; Threshold voltage; Wet etching;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.852962
  • Filename
    852962