• DocumentCode
    1361028
  • Title

    660 nm 250 mW GaInP/AlInP monolithically integrated master oscillator power amplifier

  • Author

    Pezeshki, B. ; Osinski, J.S. ; Zelinski, M. ; O´Brien, S. ; Mathur, A.

  • Author_Institution
    SDL Inc., San Jose, CA, USA
  • Volume
    33
  • Issue
    15
  • fYear
    1997
  • fDate
    7/17/1997 12:00:00 AM
  • Firstpage
    1314
  • Lastpage
    1315
  • Abstract
    The first monolithically integrated master oscillator power amplifier is reported in the GaInP/AlInP material system. A distributed Bragg reflector forms the master oscillator, and a flared amplifier provides gain. The device provides 250 mW of single frequency and single spatial mode power at 664 nm
  • Keywords
    III-V semiconductors; aluminium compounds; distributed Bragg reflector lasers; gallium compounds; indium compounds; integrated optics; power amplifiers; semiconductor lasers; 250 mW; 630 to 680 nm; 660 nm; GaInP-AlInP; distributed Bragg reflector; flared amplifier; master oscillator; monolithically integrated oscillator/amplifier; power amplifier;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19970892
  • Filename
    606076