Title :
Productivity improvements utilizing OptiScan, interlaced beam scanning, for Axcelis Purion XE implanter
Author :
Satoh, S. ; Coolbaugh, R. ; Geary, C. ; DeLuca, J.
Author_Institution :
Axcelis Technol., Beverly, MA, USA
fDate :
June 26 2014-July 4 2014
Abstract :
The Axcelis Purion XE is a RF linac based single wafer, hybrid scan, high energy ion implanter. The Purion XE provides customers the highest mechanical throughput with best in class beam currents. It is also equipped with features to fully utilize its high beam current capability such as IntelliScan. IntelliScan maintains precise dose and uniformity even under conditions of extreme photoresist outgassing due to high beam power. To further enhance the Purion XE´s industry leading productivity, OptiScan, a system for enhancing the beam utilization, has been developed.
Keywords :
ion implantation; photoresists; Axcelis Purion XE implanter; IntelliScan; OptiScan; RF linac based single wafer; class beam currents; extreme photoresist outgassing; high energy ion implanter; hybrid scan; interlaced beam scanning; productivity improvements; Implants; Ion beams; Ion implantation; Logic gates; Monitoring; Throughput; Xenon; Beam utilization; beam scan; dose control;
Conference_Titel :
Ion Implantation Technology (IIT), 2014 20th International Conference on
Conference_Location :
Portland, OR
DOI :
10.1109/IIT.2014.6940026