SEN´s SAVING techniques for productivity enhancement

Author

Ninomiya, Shiro ; Okamoto, Yuji ; Ochi, Akihiro ; Yumiyama, Toshio ; Kimura, Yuichi ; Inda, Yoshiaki ; Tsukihara, Mitsukuni

Author_Institution

SEN Corp., Saijo, Japan

fYear

2014

fDate

June 26 2014-July 4 2014

Firstpage

1

Lastpage

4

Abstract

Needless to say, productivity of ion implantation processes is a very important issue for economical device fabrication. Reduction of implant areas is one of the essential keys to increase a beam utilization factor for high-current ion implanters. SEN already developed the X-, Y-, D-, and F-SAVING system to address this issue. This time, another SAVING system, the O-SAVING, has been developed for the SHX-III/S. In result, the system reduces implant time in 40% from the original implant and more than 10% from the F-SAVING. This system can freely change the beam scan widths and positions, keeping the beam scan frequency constant. In this manner not only good uniformity is ensured but also a shape of implant area can be freely selected from arbitrary shapes such as a circle, a triangle, a semicircle, and so on.

Keywords

ion implantation; D-SAVING system; F-SAVING system; SEN SAVING techniques; SHX-III/S; X-SAVING system; Y-SAVING system; beam scan frequency constant; beam scan widths; beam utilization factor; economical device fabrication; high-current ion implanters; implant area reduction; ion implantation processes; productivity enhancement; scanning area variation implantation with narrower geometrical pattern system; Implants; Ion beams; Ion implantation; Process control; Productivity; Real-time systems; Shape; Control of scan speed; Energy-saving; Materials (process gas) saving; Productivity improvement; SAVING system;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology (IIT), 2014 20th International Conference on

Conference_Location

Portland, OR

Type

conf

DOI

10.1109/IIT.2014.6940028

Filename

6940028