• DocumentCode
    136212
  • Title

    Two-dimensional diffraction grating fabricated by maskless lithography

  • Author

    Cirino, Giuseppe A. ; Montagnoli, Arlindo N. ; Frateschi, Newton C.

  • Author_Institution
    DEE, Univ. Fed. de Sao Carlos, Sao Carlos, Brazil
  • fYear
    2014
  • fDate
    1-5 Sept. 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This work presents the fabrication of a two-dimensional diffraction grating with light phase modulation. The device was designed by employing the Iterative Fourier Transform Algorithm and fabricated by maskless direct laser writing system. Optical characterization of the diffraction pattern shown a good matching between the fabricated device and its design.
  • Keywords
    Fourier transforms; diffraction gratings; iterative methods; optical modulation; photolithography; diffraction pattern; iterative Fourier transform algorithm; light phase modulation; maskless direct laser writing system; maskless lithography; optical characterization; two-dimensional diffraction grating; Lithography; Nitrogen; Optical surface waves; Plasmas; Radio frequency; Surface treatment; Surface waves; Diffraction Gratings; Direct Laser Writing Lithography; Maskless Lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics Technology and Devices (SBMicro), 2014 29th Symposium on
  • Conference_Location
    Aracaju
  • Type

    conf

  • DOI
    10.1109/SBMicro.2014.6940083
  • Filename
    6940083