Title :
Two-dimensional diffraction grating fabricated by maskless lithography
Author :
Cirino, Giuseppe A. ; Montagnoli, Arlindo N. ; Frateschi, Newton C.
Author_Institution :
DEE, Univ. Fed. de Sao Carlos, Sao Carlos, Brazil
Abstract :
This work presents the fabrication of a two-dimensional diffraction grating with light phase modulation. The device was designed by employing the Iterative Fourier Transform Algorithm and fabricated by maskless direct laser writing system. Optical characterization of the diffraction pattern shown a good matching between the fabricated device and its design.
Keywords :
Fourier transforms; diffraction gratings; iterative methods; optical modulation; photolithography; diffraction pattern; iterative Fourier transform algorithm; light phase modulation; maskless direct laser writing system; maskless lithography; optical characterization; two-dimensional diffraction grating; Lithography; Nitrogen; Optical surface waves; Plasmas; Radio frequency; Surface treatment; Surface waves; Diffraction Gratings; Direct Laser Writing Lithography; Maskless Lithography;
Conference_Titel :
Microelectronics Technology and Devices (SBMicro), 2014 29th Symposium on
Conference_Location :
Aracaju
DOI :
10.1109/SBMicro.2014.6940083
