DocumentCode
136212
Title
Two-dimensional diffraction grating fabricated by maskless lithography
Author
Cirino, Giuseppe A. ; Montagnoli, Arlindo N. ; Frateschi, Newton C.
Author_Institution
DEE, Univ. Fed. de Sao Carlos, Sao Carlos, Brazil
fYear
2014
fDate
1-5 Sept. 2014
Firstpage
1
Lastpage
4
Abstract
This work presents the fabrication of a two-dimensional diffraction grating with light phase modulation. The device was designed by employing the Iterative Fourier Transform Algorithm and fabricated by maskless direct laser writing system. Optical characterization of the diffraction pattern shown a good matching between the fabricated device and its design.
Keywords
Fourier transforms; diffraction gratings; iterative methods; optical modulation; photolithography; diffraction pattern; iterative Fourier transform algorithm; light phase modulation; maskless direct laser writing system; maskless lithography; optical characterization; two-dimensional diffraction grating; Lithography; Nitrogen; Optical surface waves; Plasmas; Radio frequency; Surface treatment; Surface waves; Diffraction Gratings; Direct Laser Writing Lithography; Maskless Lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics Technology and Devices (SBMicro), 2014 29th Symposium on
Conference_Location
Aracaju
Type
conf
DOI
10.1109/SBMicro.2014.6940083
Filename
6940083
Link To Document