• DocumentCode
    1362899
  • Title

    A 1.6 GB/s DDR2 128 Mb Chain FeRAM With Scalable Octal Bitline and Sensing Schemes

  • Author

    Shiga, Hidehiro ; Takashima, Daisaburo ; Shiratake, Shin-ichiro ; Hoya, Katsuhiko ; Miyakawa, Tadashi ; Ogiwara, Ryu ; Fukuda, Ryo ; Takizawa, Ryosuke ; Hatsuda, Kosuke ; Matsuoka, Fumiyoshi ; Nagadomi, Yasushi ; Hashimoto, Daisuke ; Nishimura, Hisaaki ;

  • Author_Institution
    Toshiba Corp. Semicond. Co., Yokohama, Japan
  • Volume
    45
  • Issue
    1
  • fYear
    2010
  • Firstpage
    142
  • Lastpage
    152
  • Abstract
    An 87.7 mm2 1.6 GB/s 128 Mb chain FeRAM with 130 nm 4-metal CMOS process is demonstrated. In addition to small bitline capacitance inherent to chain FeRAM architecture, three new FeRAM scaling techniques - octal bitline architecture, small parasitic capacitance sensing scheme, and dual metal plateline scheme - reduce bitline capacitance from 100 fF to 60 fF. As a result, a cell signal of ±220 mV is achieved even with the small cell size of 0.252 ¿m2. An 800 Mb/s/pin read/write bandwidth at 400 MHz clock is realized by installing SDRAM compatible DDR2 interface, and performance is verified by simulation. The internal power-line bounce noise due to 400 MHz clock operation is suppressed to less than 50 mV by an event-driven current driver, which supplies several hundreds of mA of current within 2 ns response. The precise timing and voltage controls are achieved by using the data stored in a compact FeRAM-fuse, which consists of extra FeRAM memory cells placed in edge of normal array instead of conventional laser fuse links. This configuration minimizes area penalty to 0.2% without cell signal degradation.
  • Keywords
    CMOS digital integrated circuits; DRAM chips; CMOS process; DDR2 FeRAM memory cell; SDRAM compatible DDR2 interface; bandwidth 400 MHz; bit rate 1.6 Gbit/s; capacitance 100 fF to 60 fF; ferroelectric random access memory; parasitic capacitance sensing scheme; scalable octal bitline architecture; size 130 nm; time 2 ns; voltage -220 mV; voltage 220 mV; voltage 50 mV; Bandwidth; CMOS process; Clocks; Current supplies; Ferroelectric films; Nonvolatile memory; Parasitic capacitance; Random access memory; SDRAM; Timing; FeRAM; RAM; ferroelectric memory; nonvolatile memory; random access memory;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.2009.2034414
  • Filename
    5357566