DocumentCode :
1364107
Title :
Diagnostic and monitoring tools of large scale Si-manufacturing: trace-analytical tools and techniques in Si-wafer manufacturing
Author :
Fabry, Laszlo ; Köster, Ludwig ; Pahlke, Siegfried ; Kotz, Ludwig ; Hage, Jürgen
Author_Institution :
Wacker Siltronic GmbH, Burghausen, Germany
Volume :
9
Issue :
3
fYear :
1996
fDate :
8/1/1996 12:00:00 AM
Firstpage :
428
Lastpage :
436
Abstract :
In order to facilitate fast corrective actions, all process media, crucial process steps and intermediate product stages of wafering must be monitored by suitable analytical tools. The analyzes have to provide reliable, relevant and real-time results at justifiable economy. Preferably, they should be serviceable in on-line configuration under strict SPC conditions. The following chapters outline the performance of the few analytical techniques, that optimally satisfy these requirements
Keywords :
chemical analysis; elemental semiconductors; semiconductor technology; silicon; SPC; Si; diagnostic tools; large scale silicon wafer manufacturing; monitoring tools; on-line configuration; trace analysis; Atomic force microscopy; Electron microscopy; Fourier transforms; Infrared spectra; Large-scale systems; Mass spectroscopy; Monitoring; Silicon; Surface topography; Tomography;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.536113
Filename :
536113
Link To Document :
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