Micromachined thermocouple microwave detector by commercial CMOS fabrication

Author

Milanovic, V. ; Gaitan, Michael ; Zaghloul, Mona E.

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., George Washington Univ., Washington, DC, USA

Volume

46

Issue

5

fYear

1998

fDate

5/1/1998 12:00:00 AM

Firstpage

550

Lastpage

553

Abstract

This paper reports on the design and testing of a thermocouple microwave detector fabricated through a commercial CMOS foundry with an additional maskless etching procedure. The detector measures true r.m.s. power of signals in the frequency range from 50 MHz to 20 GHz, and input power range from -30 to +10 dBm, the device has linearity better than ±0.4% for input power versus output voltage over the 40 dB dynamic range. Measurements of the return loss, obtained using an automatic network analyzer, show acceptable input return loss of less than -20 dB over the entire frequency range. The sensitivity of the detector was measured to be (1.007±0.004) mV/mW

Keywords

CMOS integrated circuits; UHF measurement; electric sensing devices; etching; integrated circuit technology; micromachining; microwave detectors; microwave measurement; power measurement; thermocouples; 50 MHz to 20 GHz; commercial CMOS fabrication; maskless etching procedure; micromachined detector; sensitivity; thermocouple microwave detector; true RMS power; Detectors; Dynamic range; Etching; Foundries; Frequency measurement; Linearity; Microwave devices; Power measurement; Testing; Voltage;

fLanguage

English

Journal_Title

Microwave Theory and Techniques, IEEE Transactions on

Publisher

ieee

ISSN

0018-9480

Type

jour

DOI

10.1109/22.668656

Filename

668656