DocumentCode :
1364363
Title :
Characteristics of trenched coplanar waveguide for high-resistivity Si MMIC applications
Author :
Yang, Suidong ; Hu, Zhirun ; Buchanan, Neil B. ; Fusco, Vincent F. ; Stewart, J. A Carson ; Wu, Yunhong ; Armstrong, B. Mervyn ; Armstrong, G.A. ; Gamble, Harold S.
Author_Institution :
Dept. of Electr. & Electron. Eng., Queen´´s Univ., Belfast, UK
Volume :
46
Issue :
5
fYear :
1998
fDate :
5/1/1998 12:00:00 AM
Firstpage :
623
Lastpage :
631
Abstract :
A novel low RF loss trenched coplanar waveguide (CPW) transmission-line structure fabricated using evaporated aluminum tracks on a high-resistivity (10-kΩ cm) silicon (HRS) substrate is reported. By assuming that Schottky contact boundaries exist at the metal silicon substrate interface in the CPW line, the finite-element analysis method is used to determine the simulated behavior of the structure. The distributed capacitance, leakage conduction current, and dynamic shunt conductance for the line are shown to be a function of dc bias applied to the line, and also to reduce as a function of trench depth in the normal bias regime. Experimental results show: (1) the reduction of RF losses in comparison with conventional aluminum conductor CPW line structures may be as much as 0.5 dB/cm at 30 GHz; (2) by proper positive dc biasing of a CPW line on a p-type HRS substrate, a further reduction (0.2 dB/cm) in RF loss at 30 GHz can be achieved; (3) predicted trends in line leakage current, capacitance, and relative characteristics impedance are experimentally verified. The proposed waveguide structure may be utilized in a special fabrication process designed for RF/microwave applications
Keywords :
MMIC; Schottky barriers; aluminium; capacitance; coplanar waveguides; elemental semiconductors; finite element analysis; leakage currents; losses; silicon; 30 GHz; Al-Si; Schottky contact boundaries; Si; capacitance; dc biasing; distributed capacitance; dynamic shunt conductance; fabrication process; finite-element analysis method; high-resistivity MMIC applications; leakage conduction current; line leakage current; low RF loss; normal bias regime; p-type HRS substrate; relative characteristics impedance; transmission-line structure; trench depth; trenched coplanar waveguide; waveguide structure; Aluminum; Analytical models; Capacitance; Coplanar waveguides; Finite element methods; Propagation losses; Radio frequency; Schottky barriers; Silicon; Transmission lines;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/22.668674
Filename :
668674
Link To Document :
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