• DocumentCode
    1365591
  • Title

    Electrostatic application of pollen sprays: effects of charging field intensity and aerodynamic shear upon deposition and germinability

  • Author

    Law, S. Edward ; Wetzstein, Hazel Y. ; Banerjee, Souvik ; Eisikowitch, Dan

  • Author_Institution
    Dept. of Biol. & Agric. Eng., Georgia Univ., Athens, GA, USA
  • Volume
    36
  • Issue
    4
  • fYear
    2000
  • Firstpage
    998
  • Lastpage
    1009
  • Abstract
    Pollination deficiencies limit the biological production efficiency of certain high-value agricultural crops. To enhance pollination, an aerodynamic-electrostatic spray process has been developed which incorporates electric forces to transfer ~60-μm pollen grains to receptive stigmatic surfaces of flowers. Osmotically balanced carrier-liquid suspensions of almond pollen, pneumatically atomized at up to 276 kPa and induction charged to 12 mC/kg in 1.6-MV/m applied fields, are shown to maintain at least 80% germinability upon electrostatic deposition. Compared with uncharged spray, charged pollen deposition was significantly (∝=0.01) increased 5.6-fold as averaged across various target orientations. For difficult targets parallel to the spray´s air-carrier stream, the electrodeposition benefit for pollen was maximum (12-fold increase) and air-pressure effects were most pronounced
  • Keywords
    agriculture; electrodeposition; electrostatics; spray coating techniques; suspensions; 276 kPa; 60 mum; aerodynamic shear; aerodynamic-electrostatic spray process; agricultural crops; almond pollen; charging field intensity; deposition; electric forces; electrostatic application; germinability; induction charging; osmotically balanced carrier-liquid suspensions; pollen sprays; stigmatic surfaces; Aerodynamics; Agricultural engineering; Atomic layer deposition; Crops; Electrostatics; Industry Applications Society; Insects; Production; Spraying; Suspensions;
  • fLanguage
    English
  • Journal_Title
    Industry Applications, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-9994
  • Type

    jour

  • DOI
    10.1109/28.855953
  • Filename
    855953