Title :
A Read-Disturb-Free, Differential Sensing 1R/1W Port, 8T Bitcell Array
Author :
Kulkarni, Jaydeep P. ; Goel, Ashish ; Ndai, Patrick ; Roy, Kaushik
Author_Institution :
Circuit Res. Lab., Intel Corp., Hillsboro, OR, USA
Abstract :
We propose a read-disturb-free, 1-read/1-write port, 8-transistor (8T) bitcell utilizing differential sensing. The conflicting design requirement of read versus write operation in a conventional 6T SRAM bitcell is eliminated using separate read/write access transistors. A distributed read-access transistor shared across the bitcells of every row enables read-disturb-free differential sensing operation with eight transistors per bitcell. Write-access transistors are upsized to form a diffusion-notch-free layout which would result in improved manufacturability. 1R/1W port nature of the proposed 8T bitcell makes it an attractive choice for the high speed, dense register file (RF) designs. Bitcell failure measurements on 20 test-chips fabricated in 90-nm CMOS technology demonstrate that the proposed differential 8T bitcell shows 220 mV lower read-Vmin, 40 mV lower hold-Vmin, 25 mV higher weak-write voltage compared to the iso-area 6T bitcell at iso-performance. At 600 mV, the proposed 8T bitcell array operates up to 67.2 MHz.
Keywords :
CMOS memory circuits; SRAM chips; failure analysis; integrated circuit layout; 20 test chips fabrication; 6T SRAM bitcell; 8-transistor bitcell; 8T bitcell array; CMOS technology; bitcell failure measurement; diffusion notch free layout; distributed read access transistor; read disturb free differential sensing 1R-1W port; read-write access transistor; register file design; size 90 nm; voltage 600 mV; write access transistor; Arrays; Current measurement; Layout; Random access memory; Semiconductor device measurement; Sensors; Transistors; 1R/1W port SRAM; 8-transistor (8T) bitcell; Differential sensing; low voltage static random access memory (SRAM); process tolerance;
Journal_Title :
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
DOI :
10.1109/TVLSI.2010.2055169