• DocumentCode
    1365997
  • Title

    Low threshold 650 nm band real refractive index-guided AlGaInP laser diodes with strain-compensated MQW active layer

  • Author

    Honda, S. ; Miyake, T. ; Ikegami, T. ; Yagi, K. ; Bessho, Y. ; Hiroyama, R. ; Shone, M. ; Sawada, M.

  • Author_Institution
    LED Div., Tottori Sanyo Electr. Co Ltd., Japan
  • Volume
    36
  • Issue
    15
  • fYear
    2000
  • fDate
    7/20/2000 12:00:00 AM
  • Firstpage
    1284
  • Lastpage
    1286
  • Abstract
    650 nm band real refractive index-guided AlGaInP laser diodes with a strain-compensated MQW active layer have been successfully fabricated. A threshold current of 9 mA, which is the lowest ever reported was achieved and 5 mW operation was obtained up to 120°C. These lasers have been operated for >3000 h under 5 mW at 90°C
  • Keywords
    III-V semiconductors; MOCVD; aluminium compounds; gallium compounds; indium compounds; laser beams; optical fabrication; quantum well lasers; refractive index; 120 C; 3000 h; 5 mW; 650 nm; 9 mA; 90 C; AlGaInP; AlGaInP laser diodes; MQW active layer; fabrication; laser diodes; laser operation; low threshold refractive index-guided laser diodes; refractive index; refractive index-guided laser diodes; strain-compensated MQW active layer; threshold current;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20000907
  • Filename
    856208