Title :
Contact pressure and current density distribution in a circular contact surface
Author :
Park, Soo-Woong ; Na, Suck-Joo
Author_Institution :
Dept. of Production Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea
fDate :
6/1/1990 12:00:00 AM
Abstract :
The influence of the axisymmetric contact pressure distribution on the current density in the circular contact surface between two conducting semi-infinite bodies is theoretically analyzed by using the newly proposed mechanical asperity contact model and the electrical current flow model. The results of this study reveal that the shape of the nominal current density distribution approximates to the distribution shape of the contacting pressure but the current density on a microcontact approximates to the inverted shape of the contacting pressure. It is found that the effect of the pressure distribution shape on the overall contact resistance is not negligible and must be considered, when the mean pressure level is lower than several percentages of the hardness (i.e. contact hardness or Meyer´s hardness) of contacting materials. However, increasing the mean pressure level causes the current density to increase with increasing radial distance from the center, whereas the effect of the pressure distribution shape on the overall contact resistance weakens
Keywords :
electrical contacts; Meyer´s hardness; axisymmetric contact pressure distribution; circular contact surface; conducting semi-infinite bodies; contact hardness; current density distribution; electrical current flow model; mean pressure level; mechanical asperity contact model; microcontact approximates; overall contact resistance; pressure distribution shape; Argon; Contact resistance; Current density; Electric resistance; Gaussian distribution; Production engineering; Rough surfaces; Shape; Surface resistance; Surface roughness;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on