Title :
Influence of contact contour on breakdown behavior in vacuum under uniform field
Author :
Zhang, Yingyao ; Liu, Zhiyuan ; Cheng, Shaoyong ; Yang, Lanjun ; Geng, Yingsan ; Wang, Jimei
Author_Institution :
State Key Lab. of Electr. Insulation & Power Equip., Xi´´an Jiaotong Univ., Xi´´an, China
fDate :
12/1/2009 12:00:00 AM
Abstract :
We experimentally investigated the influence of contact contour on breakdown characteristics in vacuum under uniform field. Four vacuum interrupters were used and their contact contours were designed to obtain an effective area (Seff) from 211 mm2 to 550 mm2. The contact parameters were contact diameter 42.8 mm, contact gap 6 mm, contact thickness 16 mm and contact material CuCr50. Basic impulse level (BIL) voltage (1.2 à 50 ¿s) was applied. Experimental results revealed that the effective area Seff had a significant influence on the conditioning process. The larger the effective area was, the slower the conditioning process was. When the breakdown voltage saturated, the breakdown probability distribution followed a Weibull distribution. The shape parameter that represented the breakdown voltage scatter was constant, independent of the effective area. The effective area (Seff) had no significant influence on the breakdown voltage under a uniform field in vacuum.
Keywords :
Weibull distribution; vacuum interrupters; Weibull distribution; basic impulse level voltage; breakdown behavior; breakdown probability distribution; contact contour; vacuum interrupters; Breakdown voltage; Contacts; Dielectrics and electrical insulation; Electric breakdown; Interrupters; Laboratories; Optimization methods; Shape; Vacuum breakdown; Weibull distribution; Vacuum, breakdown characteristics, uniform field, effective area, Weibull distribution;
Journal_Title :
Dielectrics and Electrical Insulation, IEEE Transactions on
DOI :
10.1109/TDEI.2009.5361595