DocumentCode :
1366338
Title :
High-density chain ferroelectric random access memory (chain FRAM)
Author :
Takashima, Daisaburo ; Kunishima, Iwao
Author_Institution :
Adv. Semicond. Devices Labs., Toshiba Corp., Yokohama, Japan
Volume :
33
Issue :
5
fYear :
1998
fDate :
5/1/1998 12:00:00 AM
Firstpage :
787
Lastpage :
792
Abstract :
A new chain ferroelectric random access memory-a chain FRAM-has been proposed. A memory cell consists of parallel connection of one transistor and one ferroelectric capacitor, and one memory cell block consists of plural memory cells connected in series and a block selecting transistor. This configuration realizes the smallest 4 F2 size memory cell using the planar transistor so far reported, and random access. The chip size of the proposed chain FRAM can be reduced to 63% of that of the conventional FRAM when 16 cells are connected in series. The fast nondriven half-Vdd cell-plate scheme, as well as the driven cell-plate scheme, are applicable to the chain FRAM without polarization switching during the standby cycle thanks to short-circuiting ferroelectric capacitors. It results in fast access time of 45 ns and cycle time of 70 ns without refresh operation
Keywords :
cellular arrays; ferroelectric capacitors; ferroelectric storage; random-access storage; 45 ns; 70 ns; access time; block selecting transistor; chain FRAM; chain ferroelectric random access memory; chip size; cycle time; driven cell-plate scheme; ferroelectric capacitor; nondriven half-Vdd cell-plate scheme; plural memory cells; Capacitors; Fabrication; Ferroelectric films; Ferroelectric materials; Nonvolatile memory; Polarization; Random access memory; Read-write memory; Tin; Voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/4.668994
Filename :
668994
Link To Document :
بازگشت