In situ measurement of misalignment errors in free-space optical interconnects

Author

Boisset, G.C. ; Rolston, D.R. ; Robertson, B. ; Liu, Y.S. ; Iyer, R. ; Kabal, D. ; Plant, D.V.

Author_Institution

Dept. of Electr. Eng., McGill Univ., Montreal, Que., Canada

Volume

16

Issue

5

fYear

1998

fDate

5/1/1998 12:00:00 AM

Firstpage

847

Lastpage

858

Abstract

A nonobtrusive technique for measuring misalignment errors in multistage free-space optical interconnects is proposed. The technique makes use of dedicated microoptics to relay higher order dedicated alignment beams generated by an optical power supply onto alignment detectors located on the periphery of a smart pixel chip. An implementation of this technique for measuring lateral (x-y) misalignment error in a multistage optical backplane demonstrator is then presented. Performance parameters are analyzed and future directions such as photonic extensions to electronic boundary scan standards are suggested

Keywords

integrated optoelectronics; measurement errors; optical computing; optical interconnections; photodetectors; smart pixels; alignment detectors; dedicated microoptics; electronic boundary scan standards; free-space optical interconnects; higher order dedicated alignment beams; in situ measurement; lateral x-y misalignment error; misalignment error measurement; misalignment errors; multistage optical backplane; nonobtrusive technique; optical power supply; photonic extensions; smart pixel chip; Backplanes; Integrated circuit interconnections; Optical arrays; Optical beams; Optical imaging; Optical interconnections; Optical modulation; Optical receivers; Power generation; Semiconductor device measurement;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.669016

Filename

669016