Title :
Application of the LIGA process for fabrication of gas avalanche devices
Author :
Kim, H.K. ; Jackson, K. ; Hong, W.S. ; Park, I.J. ; Han, S.H. ; Kadyk, J. ; Perez-Mendez, V. ; Wenzel, W. ; Cho, G.
Author_Institution :
Div. of Phys., Lawrence Berkeley Lab., CA, USA
fDate :
6/1/2000 12:00:00 AM
Abstract :
Arrays of holes having steep wall sides have been successfully prepared by using a deep X-ray lithography technique, or LIGA process, on various thicknesses (50-1,000 μm) polymethylmethacrylate (PMMA) plastic sheets. Electrical contact layers onto the top and bottom sides were deposited by metal evaporation in a vacuum. The completed LIGA devices were studied as an alternative design of the gas electron multiplier (GEM). The first measurements of performance were very promising: a lower limit to the avalanche gain of ~3,000 was obtained, and the actual gain is probably much larger. Detailed experimental results and field simulations will be described in this study. In addition, an application of a LIGA device to serve as a drift plane electrode, avoiding the angle dependency, is discussed
Keywords :
LIGA; proportional counters; LIGA process; deep X-ray lithography technique; drift plane electrode; electrical contact layers; gas avalanche devices fabrication; gas electron multiplier; polymethylmethacrylate; steep wall sides; Dielectrics and electrical insulation; Electrodes; Electron multipliers; Fabrication; Gas insulation; Light sources; Performance gain; Physics; Resists; X-ray lithography;
Journal_Title :
Nuclear Science, IEEE Transactions on
