DocumentCode :
1367820
Title :
Effect of Mechanical and Electromechanical Stress on a-ZIO TFTs
Author :
Dey, Aritra ; Indluru, Anil ; Venugopal, Sameer M. ; Allee, David R. ; Alford, Terry L.
Author_Institution :
Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
Volume :
31
Issue :
12
fYear :
2010
Firstpage :
1416
Lastpage :
1418
Abstract :
In this letter, we report the effects of electromechanical and mechanical strain on amorphous ZIO thin-film transistors (TFTs), deformed on cylindrical surfaces of varying radii for varying time spans. The TFTs were fabricated on island structures on polyethylene napthalate and subjected to both tensile and compressive stress, parallel and perpendicular to the conducting channel length. Mobility increased while the subthreshold slope decreased with tensile stress, and reverse changes were observed with compressive stress, both being parallel to the channel length. Almost no changes were observed for perpendicular stress, within experimental errors. The magnitude of change also depended on the time duration of the strain. None of the changes were catastrophic to cause complete failure of the devices.
Keywords :
stress analysis; thin film transistors; ZnIO; a-ZIO TFT; amorphous ZIO thin film transistor; channel length; compressive stress; cylindrical surface; electromechanical strain; electromechanical stress; mobility; perpendicular stress; polyethylene napthalate; subthreshold slope; tensile stress; Amorphous silicon; Compressive stress; Strain; Tensile stress; Thin film transistors; Polyethylene napthalate (PEN); thin-film transistor (TFT); uniaxial; zinc indium oxide (ZIO);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2080350
Filename :
5618539
Link To Document :
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