• DocumentCode
    1367820
  • Title

    Effect of Mechanical and Electromechanical Stress on a-ZIO TFTs

  • Author

    Dey, Aritra ; Indluru, Anil ; Venugopal, Sameer M. ; Allee, David R. ; Alford, Terry L.

  • Author_Institution
    Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
  • Volume
    31
  • Issue
    12
  • fYear
    2010
  • Firstpage
    1416
  • Lastpage
    1418
  • Abstract
    In this letter, we report the effects of electromechanical and mechanical strain on amorphous ZIO thin-film transistors (TFTs), deformed on cylindrical surfaces of varying radii for varying time spans. The TFTs were fabricated on island structures on polyethylene napthalate and subjected to both tensile and compressive stress, parallel and perpendicular to the conducting channel length. Mobility increased while the subthreshold slope decreased with tensile stress, and reverse changes were observed with compressive stress, both being parallel to the channel length. Almost no changes were observed for perpendicular stress, within experimental errors. The magnitude of change also depended on the time duration of the strain. None of the changes were catastrophic to cause complete failure of the devices.
  • Keywords
    stress analysis; thin film transistors; ZnIO; a-ZIO TFT; amorphous ZIO thin film transistor; channel length; compressive stress; cylindrical surface; electromechanical strain; electromechanical stress; mobility; perpendicular stress; polyethylene napthalate; subthreshold slope; tensile stress; Amorphous silicon; Compressive stress; Strain; Tensile stress; Thin film transistors; Polyethylene napthalate (PEN); thin-film transistor (TFT); uniaxial; zinc indium oxide (ZIO);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2010.2080350
  • Filename
    5618539