DocumentCode :
1367826
Title :
Blue Light-Emitting Diodes With an Embedded Native Gallium Oxide Pattern Structure
Author :
Lin, Chia-Feng ; Chen, Kuei-Ting ; Huang, Kun-Pin
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Chung Hsing Univ., Taichung, Taiwan
Volume :
31
Issue :
12
fYear :
2010
Firstpage :
1431
Lastpage :
1433
Abstract :
InGaN-based light emitting diodes (LEDs) were embedded by an insulated disk-array gallium oxide (Ga2O3) pattern structure that was formed through a photoelectrochemical oxidation process on a GaN layer. A 4-μm-diameter native Ga2O3 pattern with a top air-void structure was observed in the lower undoped GaN layer acting as a lateral overgrowth mask and as a light scattering center. In the patterned-Ga2 O3 LED structure (PGO-LED), the light output power had an approximate 28% enhancement when compared to a conventional LED at 20 mA. In the PGO-LED structure, the lower piezoelectric field and the slightly higher internal quantum efficiency in the InGaN active layers were both measured through a bias-dependent and temperature-dependent microphotoluminescence measurement. The LED structure consists of Ga2O3 disk-array patterns with top air-void structures that increase external quantum efficiency for nitride-based LED applications.
Keywords :
III-V semiconductors; gallium compounds; indium compounds; light emitting diodes; light scattering; masks; oxidation; photoelectrochemistry; photoluminescence; piezoelectricity; wide band gap semiconductors; GaN; InGaN-Ga2O3; air-void structure; bias-dependent microphotoluminescence; blue light-emitting diodes; disk-array patterns; insulated disk-array gallium oxide pattern structure; internal quantum efficiency; light scattering; overgrowth mask; photoelectrochemical oxidation; piezoelectric field; size 4 mum; temperature-dependent microphotoluminescence; undoped layer; Epitaxial growth; Gallium nitride; Light emitting diodes; Oxidation; Power generation; Semiconductor device measurement; Temperature measurement; Voltage measurement; Light-emitting diodes (LEDs); optical device fabrication; oxidation; semiconductor device measurements;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2081341
Filename :
5618540
Link To Document :
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