DocumentCode
1368177
Title
Modeling the pressure dependence of DC bias voltage in asymmetric, capacitive RF sheaths
Author
Chandhok, Manish ; Grizzle, Jessy W.
Author_Institution
Intel Corp., Hillsboro, OR, USA
Volume
26
Issue
2
fYear
1998
fDate
4/1/1998 12:00:00 AM
Firstpage
181
Lastpage
189
Abstract
A semianalytical model for capacitively coupled radio frequency (RF) sheaths of asymmetric (unequal electrode area) systems has been developed. It can be applied in the high-frequency (ω > ω pi) regime at different pressures. An analytical approximation to the pressure-dependent ion density profile is used. The time-varying electric field and potential within the sheath are obtained by solving Poisson´s equation. The current balance and zero net DC current conditions are applied to solve for the RF sheath parameters and DC bias voltage. The DC voltage ratio between the powered and grounded electrode sheaths increases as the pressure decreases, which results in a larger DC bias voltage at lower pressures
Keywords
ion density; plasma density; plasma sheaths; DC bias voltage; Poisson´s equation; analytical approximation; asymmetric capacitive RF sheaths; asymmetric unequal electrode area systems; current balance; electrode sheaths; modeling; potential; pressure dependence; pressure-dependent ion density profile; semianalytical model; time-varying electric field; zero net DC current conditions; Electrodes; Electrons; Plasma applications; Plasma density; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma temperature; Radio frequency; Voltage;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.669625
Filename
669625
Link To Document