• DocumentCode
    1368177
  • Title

    Modeling the pressure dependence of DC bias voltage in asymmetric, capacitive RF sheaths

  • Author

    Chandhok, Manish ; Grizzle, Jessy W.

  • Author_Institution
    Intel Corp., Hillsboro, OR, USA
  • Volume
    26
  • Issue
    2
  • fYear
    1998
  • fDate
    4/1/1998 12:00:00 AM
  • Firstpage
    181
  • Lastpage
    189
  • Abstract
    A semianalytical model for capacitively coupled radio frequency (RF) sheaths of asymmetric (unequal electrode area) systems has been developed. It can be applied in the high-frequency (ω > ω pi) regime at different pressures. An analytical approximation to the pressure-dependent ion density profile is used. The time-varying electric field and potential within the sheath are obtained by solving Poisson´s equation. The current balance and zero net DC current conditions are applied to solve for the RF sheath parameters and DC bias voltage. The DC voltage ratio between the powered and grounded electrode sheaths increases as the pressure decreases, which results in a larger DC bias voltage at lower pressures
  • Keywords
    ion density; plasma density; plasma sheaths; DC bias voltage; Poisson´s equation; analytical approximation; asymmetric capacitive RF sheaths; asymmetric unequal electrode area systems; current balance; electrode sheaths; modeling; potential; pressure dependence; pressure-dependent ion density profile; semianalytical model; time-varying electric field; zero net DC current conditions; Electrodes; Electrons; Plasma applications; Plasma density; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma temperature; Radio frequency; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.669625
  • Filename
    669625