DocumentCode :
1368784
Title :
Monte Carlo Simulation of {\\rm Al}_{x}{\\rm Ga}_{1-{x}}{\\rm As}~(x\\geq 0.6) Avalanche Photodiodes
Author :
Sun, Wenlu ; Zheng, Xiaoguang ; Lu, Zhiwen ; Campbell, Joe C.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Virginia, Charlottesville, VA, USA
Volume :
47
Issue :
12
fYear :
2011
Firstpage :
1531
Lastpage :
1536
Abstract :
In this paper, a Monte Carlo model is used to investigate the impact ionization properties of AlxGa1-xAs with a high composition of Al (x ≥ 0.6). Two Geiger-mode avalanche photodiode (APD) structures using AlxGa1-xAs as the multiplication region are studied. Simulations show a strong link between the APD properties and the electric field profile. It was also found that Al9.6Ga0.4As APD structure has higher excess noise and more abrupt breakdown probability compared to Al0.8Ga0.2As.
Keywords :
Monte Carlo methods; aluminium compounds; avalanche photodiodes; ionisation; Geiger mode avalanche photodiode; Monte Carlo simulation; avalanche photodiodes; breakdown probability; electric field profile; high composition; ionization properties; Avalanche photodiodes; Gallium arsenide; Impact ionization; Monte Carlo methods; Photodetectors; Semiconductor process modeling; Avalanche photodiode; Monte Carlo simulation; breakdown probability; impact ionization; photodetector;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.2011.2174616
Filename :
6069809
Link To Document :
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