DocumentCode :
1368863
Title :
A new method for treating fluorine wastewater to reduce sludge and running costs
Author :
Toyoda, Arata ; Taira, Tsutomu
Author_Institution :
NEC Corp., Kawasaki, Japan
Volume :
13
Issue :
3
fYear :
2000
fDate :
8/1/2000 12:00:00 AM
Firstpage :
305
Lastpage :
309
Abstract :
Reduction of the sludge generated in fluorine wastewater treatment is a critical problem for the semiconductor industry. We have developed a new method for treating fluorine wastewater in order to reduce sludge and running costs. This method utilizes a small amount of Al(OH)3 not only as an aggregator for CaF2 generated from fluoride ions in the wastewater but also as an effective fluorine adsorbent. The Al(OH)3 as fluorine adsorbent is used repeatedly through an AI(OH)3 reclamation process. This method can effectively treat the concentrated fluorine wastewater to achieve an exceedingly low concentration in one-step treatment. We constructed a practical treatment system using this method by modifying part of an existing conventional system. This new treatment system is able to reduce both the total sludge and running costs to about one-tenth those of a conventional system
Keywords :
fluorine; integrated circuit economics; water pollution control; water treatment; Al(OH)3; CaF2; adsorbent; aggregator; one-step treatment; reclamation process; running costs; semiconductor industry; sludge; wastewater treatment; Calcium; Capacitance; Costs; Electronics industry; Industrial waste; Manufacturing processes; National electric code; Semiconductor materials; Sludge treatment; Wastewater treatment;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.857940
Filename :
857940
Link To Document :
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