Title :
A monolithically integrated double Michelson interferometer for optical displacement measurement with direction determination
Author :
Hofstetter, D. ; Zappe, H.P. ; Dändliker, R.
Author_Institution :
Paul Scherrer Inst., Villigen, Switzerland
Abstract :
A monolithically integrated optical displacement sensor fabricated in the GaAs-AlGaAs material system is reported. The single-chip device consists of a distributed Bragg reflector laser, two photodetectors, two phase modulators, two Y-couplers, and two directional couplers. It is configured as a double Michelson interferometer and allows the determination of both magnitude and direction of a displacement. The detection of two 90/spl deg/ phase-shifted interferometer signals also resulted in on improved phase interpolation of o/20. Despite the relatively simple fabrication process, the integration of rather complex optical functions could be realized.
Keywords :
III-V semiconductors; Michelson interferometers; aluminium compounds; displacement measurement; distributed Bragg reflector lasers; electro-optical modulation; gallium arsenide; integrated optoelectronics; optical directional couplers; optical fabrication; optical sensors; phase modulation; photodetectors; semiconductor lasers; GaAs quantum well; GaAs-AlGaAs; GaAs-AlGaAs material system; Y-couplers; complex optical functions; direction determination; directional couplers; distributed Bragg reflector laser; double Michelson interferometer; monolithically integrated; optical displacement measurement; optical displacement sensor fabrication; phase interpolation; phase modulators; phase-shifted interferometer signals; photodetectors; single-chip device; Displacement measurement; Distributed Bragg reflectors; Integrated optics; Optical interferometry; Optical materials; Optical modulation; Optical sensors; Phase shifting interferometry; Photodetectors; Sensor systems;
Journal_Title :
Photonics Technology Letters, IEEE
