DocumentCode :
1369564
Title :
Benchmarking the Productivity of Photomask Manufacturers
Author :
Berglund, C. Neil ; Weber, Charles M. ; Gabella, Patricia
Author_Institution :
Northwest Technol. Group, Camas, WA, USA
Volume :
22
Issue :
4
fYear :
2009
Firstpage :
499
Lastpage :
506
Abstract :
A survey-based, empirical study that benchmarks the productivity of photomask manufacturers has led to some significant conclusions. First, the wide variation in the productivity indicators from company to company suggests that all participants may have significant cost-reduction opportunities within their operations. Second, the high downtime of pattern generation tools is limiting productivity. Third, producing smaller feature sizes is correlated to an investment in engineering and experimentation capacity. It could not be confirmed that photomask manufacturers are successfully taking advantage of economies of scale, suggesting that the outlook for profitability of many photomask manufacturers is precarious.
Keywords :
masks; productivity; pattern generation tools; photomask manufacturers; productivity; Benchmarking; manufacturing; photomask; productivity;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2009.2031785
Filename :
5238631
Link To Document :
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