DocumentCode
1369564
Title
Benchmarking the Productivity of Photomask Manufacturers
Author
Berglund, C. Neil ; Weber, Charles M. ; Gabella, Patricia
Author_Institution
Northwest Technol. Group, Camas, WA, USA
Volume
22
Issue
4
fYear
2009
Firstpage
499
Lastpage
506
Abstract
A survey-based, empirical study that benchmarks the productivity of photomask manufacturers has led to some significant conclusions. First, the wide variation in the productivity indicators from company to company suggests that all participants may have significant cost-reduction opportunities within their operations. Second, the high downtime of pattern generation tools is limiting productivity. Third, producing smaller feature sizes is correlated to an investment in engineering and experimentation capacity. It could not be confirmed that photomask manufacturers are successfully taking advantage of economies of scale, suggesting that the outlook for profitability of many photomask manufacturers is precarious.
Keywords
masks; productivity; pattern generation tools; photomask manufacturers; productivity; Benchmarking; manufacturing; photomask; productivity;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2009.2031785
Filename
5238631
Link To Document