• DocumentCode
    1369564
  • Title

    Benchmarking the Productivity of Photomask Manufacturers

  • Author

    Berglund, C. Neil ; Weber, Charles M. ; Gabella, Patricia

  • Author_Institution
    Northwest Technol. Group, Camas, WA, USA
  • Volume
    22
  • Issue
    4
  • fYear
    2009
  • Firstpage
    499
  • Lastpage
    506
  • Abstract
    A survey-based, empirical study that benchmarks the productivity of photomask manufacturers has led to some significant conclusions. First, the wide variation in the productivity indicators from company to company suggests that all participants may have significant cost-reduction opportunities within their operations. Second, the high downtime of pattern generation tools is limiting productivity. Third, producing smaller feature sizes is correlated to an investment in engineering and experimentation capacity. It could not be confirmed that photomask manufacturers are successfully taking advantage of economies of scale, suggesting that the outlook for profitability of many photomask manufacturers is precarious.
  • Keywords
    masks; productivity; pattern generation tools; photomask manufacturers; productivity; Benchmarking; manufacturing; photomask; productivity;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2009.2031785
  • Filename
    5238631