DocumentCode :
1370241
Title :
Novel test structure for the measurement of electrostatic discharge pulses [MOS ICs]
Author :
Lendenmann, Heinz ; Schrimpf, Ronald D. ; Bridges, Andrew D.
Author_Institution :
Swiss Federal Inst. of Technol., Zurich, Switzerland
Volume :
4
Issue :
3
fYear :
1991
fDate :
8/1/1991 12:00:00 AM
Firstpage :
213
Lastpage :
218
Abstract :
A test structure for the measurement of electrostatic discharge (ESD) pulses using a floating gate transistor is presented. It was found that ESD pulses of a wide range of magnitudes can cause a shift in the threshold voltage of such a floating gate transistor. The change in device characteristics was quantified by measuring the drain current. For a given geometry, the response was proportional to the magnitude of the ESD event for a particular range of voltages. This particular range of sensitivity also scales linearly with the capacitance ratio of the devices studied. Numerical simulation of a simple model of the device leads to sufficiently accurate results for the design of a specific sensitivity if the processing parameters are considered. The lowest sensitivity determined was 60 V
Keywords :
MOS integrated circuits; electric variables measurement; electrostatic discharge; integrated circuit testing; semiconductor device models; 60 V; CMOS IC; ESD pulses; MOS IC; MOS ICs; capacitance ratio; drain current; electrostatic discharge pulses; floating gate transistor; measurement; model; test structure; threshold voltage; Bridge circuits; Electrons; Electrostatic discharge; Electrostatic measurements; FETs; Nonvolatile memory; Pulse measurements; Semiconductor device measurement; Testing; Voltage;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.85942
Filename :
85942
Link To Document :
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