DocumentCode :
1370325
Title :
Analysis of low-temperature surface discharge plasma products from gaseous organic compounds
Author :
Oda, Tetsuji ; Yamashita, Ryuichi ; Tanaka, Kuninori ; Takahashi, Tadashi ; Masuda, Senichi
Author_Institution :
Dept. of Electr. Eng., Tokyo Univ., Japan
Volume :
32
Issue :
5
fYear :
1996
Firstpage :
1044
Lastpage :
1050
Abstract :
Nonequilibrium low-temperature discharge plasma decomposition products of 1000 ppm gaseous organic compounds contaminated in atmospheric pressure air, nitrogen, or oxygen, such as chlorofluorocarbon (CFC-113), organic chloride (trichloroethylene), and carbon tetrachloride, were studied for a better understanding of the decomposition mechanism of the plasma processing. A gas chromatograph-mass spectrometer was used as a main analyzing equipment. When the decomposition rate is not high (20-80%) for CFC-113, many various halogenated carbons or halogenated hydrocarbons are identified as intermediate products by the plasma processing. As the electric discharge power consumption increases, the decomposition rate of CFC-113 increases and intermediate products decrease. At the decomposition rate of more than 90%, some elemental products of hydrochloric acid, carbon dioxide, and nitrogen suboxide are recognized as final products. On the other hand, if the environmental gas is pure nitrogen without any oxygen and water vapor, the decomposition products are still intermediate with sufficient electric discharge power consumption, suggesting the existence of double decomposition mechanisms of nitrogen radicals and oxygen radicals. In the case of trichloroethylene decomposition, harmful intermediate decomposition products were observed when the decomposition rate was 20-90%
Keywords :
chemical industry; chromatography; decomposition; organic compounds; plasma applications; power consumption; surface discharges; CFC-113; carbon tetrachloride; chlorofluorocarbon; decomposition mechanism; decomposition products; decomposition rate; double decomposition mechanisms; electric discharge; gas chromatograph-mass spectrometer; gaseous organic compounds; halogenated carbons; halogenated hydrocarbons; intermediate products; low-temperature surface discharge plasma products; nitrogen radicals; organic chloride; oxygen radicals; plasma processing; power consumption; trichloroethylene; Atmospheric-pressure plasmas; Carbon compounds; Energy consumption; Hydrocarbons; Nitrogen; Organic compounds; Plasma materials processing; Spectroscopy; Surface contamination; Surface discharges;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/28.536864
Filename :
536864
Link To Document :
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