DocumentCode
1372886
Title
Experimental demonstration of single peak IV characteristics in a novel resonant tunneling diode
Author
Arai, Kunihiro ; Yamamoto, Masafumi
Author_Institution
NTT Syst. Electron. Labs., Kanagawa, Japan
Volume
17
Issue
10
fYear
1996
Firstpage
491
Lastpage
493
Abstract
Single peak IV characteristics are experimentally demonstrated by a novel resonant tunneling diode, a resonant tunneling pinch-off diode (RTPD), specially designed to make the coupling between the pinch-off effect and the resonant tunneling effect in the diode itself effective. RTPDs were fabricated using the InGaAs-AlAs-InAlAs material system grown by MBE on semi-insulating InP substrate. Device parameter (emitter width and collector thickness) dependence of the IV characteristics is investigated and compared with previously reported theory. Good agreement between them confirms that the mechanism that brings about the novel characteristics in the RTPD is the above mentioned coupling, and gives guidelines for achieving an RTPD with ideal single peak IV characteristics.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; molecular beam epitaxial growth; resonant tunnelling diodes; InGaAs-AlAs-InAlAs; InGaAs-AlAs-InAlAs material system; InP; MBE growth; RTPD; collector thickness; emitter width; pinchoff effect; resonant tunneling effect; resonant tunneling pinch-off diode; semi-insulating InP substrate; single peak I-V characteristics; Circuits; Electrons; Guidelines; Hysteresis; Indium phosphide; Pulse measurements; Resonant tunneling devices; Semiconductor diodes; Substrates; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.537085
Filename
537085
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