• DocumentCode
    1372886
  • Title

    Experimental demonstration of single peak IV characteristics in a novel resonant tunneling diode

  • Author

    Arai, Kunihiro ; Yamamoto, Masafumi

  • Author_Institution
    NTT Syst. Electron. Labs., Kanagawa, Japan
  • Volume
    17
  • Issue
    10
  • fYear
    1996
  • Firstpage
    491
  • Lastpage
    493
  • Abstract
    Single peak IV characteristics are experimentally demonstrated by a novel resonant tunneling diode, a resonant tunneling pinch-off diode (RTPD), specially designed to make the coupling between the pinch-off effect and the resonant tunneling effect in the diode itself effective. RTPDs were fabricated using the InGaAs-AlAs-InAlAs material system grown by MBE on semi-insulating InP substrate. Device parameter (emitter width and collector thickness) dependence of the IV characteristics is investigated and compared with previously reported theory. Good agreement between them confirms that the mechanism that brings about the novel characteristics in the RTPD is the above mentioned coupling, and gives guidelines for achieving an RTPD with ideal single peak IV characteristics.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; molecular beam epitaxial growth; resonant tunnelling diodes; InGaAs-AlAs-InAlAs; InGaAs-AlAs-InAlAs material system; InP; MBE growth; RTPD; collector thickness; emitter width; pinchoff effect; resonant tunneling effect; resonant tunneling pinch-off diode; semi-insulating InP substrate; single peak I-V characteristics; Circuits; Electrons; Guidelines; Hysteresis; Indium phosphide; Pulse measurements; Resonant tunneling devices; Semiconductor diodes; Substrates; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.537085
  • Filename
    537085