DocumentCode :
1373286
Title :
Atomic Oxygen Maximization in High-Voltage Pulsed Cold Atmospheric Plasma Jets
Author :
Georgescu, Nicolae ; Lungu, Cristian P. ; Lupu, Andreea Roxana ; Osiac, Mariana
Author_Institution :
Nat. Inst. for Laser, Plasma & Radiat. Phys., Bucharest, Romania
Volume :
38
Issue :
11
fYear :
2010
Firstpage :
3156
Lastpage :
3162
Abstract :
This paper presents a new device generating high-voltage pulsed cold atmospheric plasma jets. With these plasmas, the quantity of atomic oxygen (and, accordingly, the chemical activity) is a lot higher than that in previous researches. The main characteristic of the new device is the usage of three tubular needle-type electrodes connected in parallel. By applying high-voltage pulses (with 20-30-kV amplitude, duration of hundreds of nanoseconds, and hundreds of pulses per second), three independent discharges are formed in the discharge room. The plasma-forming gas is He, with a low quantity of oxygen introduced through the high-voltage electrodes. Each discharge has an optimal percentage of 0.5 % vol. O2 in He, which maximizes the quantity of atomic oxygen in the plasma. The plasmas of the three discharges unite to a single jet though, which contains a quantity of atomic oxygen that is a lot higher than that of the plasma of each discharge. The emission spectra of the plasma jets show the maximization of the intensity of the O I 777 nm line when a concentration of 1.5% vol. O2 in He (three times higher than so far) is introduced in the plasma-forming gas.
Keywords :
discharges (electric); helium; oxygen; plasma diagnostics; plasma jets; He-O2; atomic oxygen maximization; discharge room; emission spectra; high-voltage electrodes; high-voltage pulsed cold atmospheric plasma jets; high-voltage pulses; independent discharges; plasma-forming gas; tubular needle-type electrodes; voltage 20 kV to 30 kV; Atomic oxygen; Discharges; Electrodes; Helium; Microorganisms; Voltage control; Atomic oxygen; cold atmospheric plasma jets; pulsed high voltage;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2010.2070811
Filename :
5625074
Link To Document :
بازگشت