Title :
A 0.008-mm2 area-optimized thermal-diffusivity-based temperature sensor in 160-nm CMOS for SoC thermal monitoring
Author :
Sonmez, Ugur ; Rui Quan ; Sebastiano, Fabio ; Makinwa, Kofi A. A.
Author_Institution :
Electron. Instrum. Lab., Delft Univ. of Technol., Delft, Netherlands
Abstract :
An array of temperature sensors based on the temperature-dependent thermal diffusivity of bulk silicon has been realized in a standard 160-nm CMOS process. The sensors achieve an inaccuracy of ±2.4 °C (3σ) from -40 to 125 °C with no trimming and ±0.65 °C (3σ) with a one temperature trim. Each sensor occupies 0.008 mm2, and achieves a resolution of 0.21 °C (rms) at 1 kSa/s. This combination of accuracy, speed, and small size makes such sensors well suited for thermal monitoring in microprocessors and other systems-on-chip.
Keywords :
CMOS integrated circuits; system-on-chip; temperature measurement; temperature sensors; thermal diffusivity; SoC thermal monitoring; area-optimized thermal-diffusivity-based temperature sensor; bulk silicon; microprocessors; size 160 nm; standard CMOS process; systems-on-chip; temperature-dependent thermal diffusivity; thermal monitoring; Accuracy; Heating; System-on-chip; Temperature measurement; Temperature sensors;
Conference_Titel :
European Solid State Circuits Conference (ESSCIRC), ESSCIRC 2014 - 40th
Conference_Location :
Venice Lido
Print_ISBN :
978-1-4799-5694-4
DOI :
10.1109/ESSCIRC.2014.6942105
