Title :
Analytic description of short-channel effects in fully-depleted double-gate and cylindrical, surrounding-gate MOSFETs
Author :
Oh, Sang-Hyun ; Monroe, Don ; Hergenrother, J.M.
Author_Institution :
Lucent Technol. Bell Labs., Murray Hill, NJ, USA
Abstract :
Short-channel effects in fully-depleted double-gate (DG) and cylindrical, surrounding-gate (Cyl) MOSFETs are governed by the electrostatic potential as confined by the gates, and thus by the device dimensions. The simple but powerful evanescent-mode analysis shows that the length /spl lambda/, over which the source and drain perturb the channel potential, is 1//spl pi/ of the effective device thickness in the double-gate case, and 1/4.810 of the effective diameter in the cylindrical case, in excellent agreement with PADRE device simulations. Thus for equivalent silicon and gate oxide thicknesses, evanescent-mode analysis indicates that Cyl-MOSFETs can be scaled to 35% shorter channel lengths than DG-MOSFETs.
Keywords :
Electric potential; MOSFET; Semiconductor device models; MOSFET scaling; PADRE device simulations; Si thickness; channel potential; cylindrical surrounding-gate MOSFETs; device dimensions; effective device thickness; electrostatic potential; evanescent-mode analysis; fully-depleted double-gate MOSFETs; gate oxide thickness; parabolic approximation; short-channel effects; transverse confinement; Analytical models; Degradation; Doping; Electrostatic analysis; Geometry; Laplace equations; MOSFETs; Poisson equations; Silicon; Subthreshold current;
Journal_Title :
Electron Device Letters, IEEE