• DocumentCode
    1374559
  • Title

    Phase-sensitive vision technique for high accuracy position measurement of moving targets

  • Author

    Sandoz, Patrick ; Ravassard, Jean Christophe ; Dembélé, Sounkalo ; Janex, André

  • Author_Institution
    CNRS, Univ. de Franche-Comte, Besancon, France
  • Volume
    49
  • Issue
    4
  • fYear
    2000
  • fDate
    8/1/2000 12:00:00 AM
  • Firstpage
    867
  • Lastpage
    872
  • Abstract
    This paper presents a vision technique for position and displacement measurement of moving targets. An adapted phase reference pattern is fixed to the object to be controlled and allows the location of the object in the scene observed by a static camera with an accuracy better than 10-2 pixel. The phase reference pattern is scaled as a function of the desired field of observation and position accuracy. Then the system measurement performances can be chosen from the nanometer to the millimeter ranges (or even larger). Furthermore, the method is self calibrating in length, since the phase reference pattern includes its own length reference. Drifts in vision system magnification therefore do not affect the measurement accuracy. Applications can be used in different fields, for instance, the position control of masks and wafers in photolithography processes or the servo-control of micro-robots
  • Keywords
    computer vision; computerised instrumentation; displacement measurement; image processing; integrated circuit technology; micropositioning; photolithography; position control; position measurement; target tracking; wavelet transforms; adapted phase reference pattern; displacement measurement; drifts; high accuracy; machine vision; masks; micro-robots; moving targets; phase-sensitive vision; photolithography; position accuracy; position control; position measurement; self calibration; servo-control; static camera; vision system magnification; wafers; wavelet transforms; Cameras; Displacement measurement; Layout; Machine vision; Optical distortion; Optical interferometry; Position measurement; Strips; Wavelet analysis; Wavelet transforms;
  • fLanguage
    English
  • Journal_Title
    Instrumentation and Measurement, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9456
  • Type

    jour

  • DOI
    10.1109/19.863940
  • Filename
    863940