• DocumentCode
    1374804
  • Title

    Sol-gel hybrid glass diffractive elements by direct electron-beam exposure

  • Author

    Rantala, J.T. ; Nordman, N. ; Nordman, O. ; Vähäkangas, J. ; Honkanen, S. ; Peyghambarian, N.

  • Author_Institution
    Opt. Sci. Center, Arizona Univ., Tucson, AZ, USA
  • Volume
    34
  • Issue
    5
  • fYear
    1998
  • fDate
    3/5/1998 12:00:00 AM
  • Firstpage
    455
  • Lastpage
    456
  • Abstract
    The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings
  • Keywords
    diffraction gratings; electron beam lithography; etching; optical planar waveguides; sol-gel processing; waveguide components; apodised planar waveguide gratings; direct electron-beam exposure; electron-beam writing; etch depth; integrated optics; multi-phase-level diffractive elements; phase delay; sol-gel hybrid glass diffractive elements; surface relief diffractive elements;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19980368
  • Filename
    674214
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1374804