• DocumentCode
    1376320
  • Title

    Double Contacts for Improved Performance of Graphene Transistors

  • Author

    Franklin, Aaron D. ; Han, Shu-Jen ; Bol, Ageeth A. ; Perebeinos, Vasili

  • Author_Institution
    IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    33
  • Issue
    1
  • fYear
    2012
  • Firstpage
    17
  • Lastpage
    19
  • Abstract
    A new double-contact geometry for graphene devices is studied and compared to traditional top contacts. Double contacts consist of metal below and above the graphene in a sandwich-type configuration. Four-probe structures were tested for both single-layer [chemical-vapor-deposition (CVD)-grown] graphene and bilayer (mechanically exfoliated) graphene, with both showing a decrease in contact resistance of at least 40% and an increase in transconductance greater than 20%. CVD-grown single-layer graphene transistors exhibited contact resistance as low as 260 Ω·μm, with an average of 320 Ω·μm. This new geometry can help minimize the impact of contacts on graphene device performance.
  • Keywords
    chemical vapour deposition; contact resistance; geometry; graphene; CVD-grown single-layer graphene transistor; chemical-vapor-deposition; contact resistance; double-contact geometry; four-probe structure; graphene device performance; sandwich-type configuration; Contact resistance; Doping; Geometry; Logic gates; Metals; Resistance; Transistors; Contact geometry; contact resistance; double contacts; field-effect transistor; graphene;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2173154
  • Filename
    6081897