DocumentCode
1376320
Title
Double Contacts for Improved Performance of Graphene Transistors
Author
Franklin, Aaron D. ; Han, Shu-Jen ; Bol, Ageeth A. ; Perebeinos, Vasili
Author_Institution
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
33
Issue
1
fYear
2012
Firstpage
17
Lastpage
19
Abstract
A new double-contact geometry for graphene devices is studied and compared to traditional top contacts. Double contacts consist of metal below and above the graphene in a sandwich-type configuration. Four-probe structures were tested for both single-layer [chemical-vapor-deposition (CVD)-grown] graphene and bilayer (mechanically exfoliated) graphene, with both showing a decrease in contact resistance of at least 40% and an increase in transconductance greater than 20%. CVD-grown single-layer graphene transistors exhibited contact resistance as low as 260 Ω·μm, with an average of 320 Ω·μm. This new geometry can help minimize the impact of contacts on graphene device performance.
Keywords
chemical vapour deposition; contact resistance; geometry; graphene; CVD-grown single-layer graphene transistor; chemical-vapor-deposition; contact resistance; double-contact geometry; four-probe structure; graphene device performance; sandwich-type configuration; Contact resistance; Doping; Geometry; Logic gates; Metals; Resistance; Transistors; Contact geometry; contact resistance; double contacts; field-effect transistor; graphene;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2011.2173154
Filename
6081897
Link To Document