DocumentCode :
1376320
Title :
Double Contacts for Improved Performance of Graphene Transistors
Author :
Franklin, Aaron D. ; Han, Shu-Jen ; Bol, Ageeth A. ; Perebeinos, Vasili
Author_Institution :
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
33
Issue :
1
fYear :
2012
Firstpage :
17
Lastpage :
19
Abstract :
A new double-contact geometry for graphene devices is studied and compared to traditional top contacts. Double contacts consist of metal below and above the graphene in a sandwich-type configuration. Four-probe structures were tested for both single-layer [chemical-vapor-deposition (CVD)-grown] graphene and bilayer (mechanically exfoliated) graphene, with both showing a decrease in contact resistance of at least 40% and an increase in transconductance greater than 20%. CVD-grown single-layer graphene transistors exhibited contact resistance as low as 260 Ω·μm, with an average of 320 Ω·μm. This new geometry can help minimize the impact of contacts on graphene device performance.
Keywords :
chemical vapour deposition; contact resistance; geometry; graphene; CVD-grown single-layer graphene transistor; chemical-vapor-deposition; contact resistance; double-contact geometry; four-probe structure; graphene device performance; sandwich-type configuration; Contact resistance; Doping; Geometry; Logic gates; Metals; Resistance; Transistors; Contact geometry; contact resistance; double contacts; field-effect transistor; graphene;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2173154
Filename :
6081897
Link To Document :
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