Title :
Influence of buffer layer and processing on the dark current of 2.5 μm-wavelength 2%-mismatched InGaAs photodetectors
Author :
D´Hondt, M. ; Moerman, I. ; Van Daele, P. ; Demeester, P.
Author_Institution :
Dept. of Inf. Technol., Ghent Univ., Belgium
fDate :
10/1/1997 12:00:00 AM
Abstract :
An extensive study is presented in which different buffer layers for the growth of 2.5 μm wavelength mismatched InGaAs photodetectors are compared. The dark current of the photodetectors is measured to judge the quality of the buffer layers. These differ in material composition (InGaAs or InAsP), grading mechanism (linear or stepwise), total buffer-layer thickness and number of steps. It is shown that the detectors with a thick InAsP buffer, grown on a 2°-off-oriented substrate, lead to the lowest dark currents. Different processing schemes are compared and it is shown experimentally that the dark current of a mesa-type detector consists of a part proportional to the circumference and one proportional to the detector area. The latter part is shown to be equal to the dark current of a planar Zn-diffused detector with the same dimensions
Keywords :
III-V semiconductors; dark conductivity; gallium arsenide; indium compounds; infrared detectors; optical materials; photodetectors; 2°-off-oriented substrate; 2.5 mum; IR detectors; InAsP; InGaAs; InGaAs photodetectors; Zn; buffer layer; buffer layers; dark current; grading mechanism; lowest dark currents; material composition; mesa-type detector; planar Zn-diffused detector; thick InAsP buffer; total buffer-layer thickness; wavelength mismatched InGaAs photodetectors;
Journal_Title :
Optoelectronics, IEE Proceedings -
DOI :
10.1049/ip-opt:19971412