Title :
Guided-wave laser based on erbium-doped silica planar lightwave circuit
Author :
Kitagawa, T. ; Hattori, K. ; Shimizu, M. ; Ohmori, Y. ; Kobayashi, M.
Author_Institution :
NTT, Opto-Electron. Labs., Ibaraki, Japan
Abstract :
The Er-doped silica guided-wave laser operating around 1.6 mu m was realised using a low-scattering-loss planar lightwave circuit with an Er-doped silica core which was fabricated by flame hydrolysis deposition and reactive ion etching techniques on an Si substrate. CW lasing was achieved successfully with an incident threshold power of 49 mW for pumping at 0.98 mu m.
Keywords :
erbium; fibre lasers; optical workshop techniques; silicon compounds; sputter etching; 0.98 micron; 1.6 micron; 49 mW; CW lasing; Er 3+:silica; Si; Si-SiO 2:Er 3+; flame hydrolysis deposition; incident threshold power; low-scattering-loss planar lightwave circuit; reactive ion etching techniques;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19910211
