• DocumentCode
    1379656
  • Title

    Large UV-induced negative index changes in germanium-free nitrogen-doped planar SiO2 waveguides

  • Author

    Wiesmann, Dorothea ; Hubner, J. ; Germann, R. ; Salemink, H.W.M. ; Bona, G.L. ; Kristensen, M. ; Jackel, Heinz

  • Author_Institution
    Electron. Lab., Eidgenossische Tech. Hochschule, Zurich
  • Volume
    34
  • Issue
    4
  • fYear
    1998
  • fDate
    2/19/1998 12:00:00 AM
  • Firstpage
    364
  • Lastpage
    366
  • Abstract
    Negative refractive index changes of up to 1.7×10-3 have been induced by 248 nm excimer laser light in planar germanium-free SiON waveguides. Highly temperature-stable 40 dB Bragg gratings with a length of 8 mm have been written. A novel mechanism of photosensitisation was used to create the high-index changes
  • Keywords
    diffraction gratings; laser beam effects; optical planar waveguides; refractive index; silicon compounds; 248 nm; SiON; UV-induced negative refractive index change; excimer laser light; germanium-free nitrogen-doped planar SiO2 waveguide; photosensitisation; temperature-stable Bragg grating;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19980288
  • Filename
    675697
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1379656