DocumentCode :
1379656
Title :
Large UV-induced negative index changes in germanium-free nitrogen-doped planar SiO2 waveguides
Author :
Wiesmann, Dorothea ; Hubner, J. ; Germann, R. ; Salemink, H.W.M. ; Bona, G.L. ; Kristensen, M. ; Jackel, Heinz
Author_Institution :
Electron. Lab., Eidgenossische Tech. Hochschule, Zurich
Volume :
34
Issue :
4
fYear :
1998
fDate :
2/19/1998 12:00:00 AM
Firstpage :
364
Lastpage :
366
Abstract :
Negative refractive index changes of up to 1.7×10-3 have been induced by 248 nm excimer laser light in planar germanium-free SiON waveguides. Highly temperature-stable 40 dB Bragg gratings with a length of 8 mm have been written. A novel mechanism of photosensitisation was used to create the high-index changes
Keywords :
diffraction gratings; laser beam effects; optical planar waveguides; refractive index; silicon compounds; 248 nm; SiON; UV-induced negative refractive index change; excimer laser light; germanium-free nitrogen-doped planar SiO2 waveguide; photosensitisation; temperature-stable Bragg grating;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19980288
Filename :
675697
Link To Document :
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