High-Power 980-nm Broad-Area Lasers Spectrally Stabilized by Surface Bragg Gratings

Author

Fricke, J. ; Bugge, F. ; Ginolas, A. ; John, W. ; Klehr, A. ; Matalla, M. ; Ressel, P. ; Wenzel, H. ; Erbert, G.

Author_Institution

Ferdinand-Braun-Inst. fur Hochstfrequenztechnik, Berlin, Germany

Volume

22

Issue

5

fYear

2010

fDate

3/1/2010 12:00:00 AM

Firstpage

284

Lastpage

286

Abstract

We report on broad-area distributed Bragg reflector (DBR) lasers with a stripe width of 90 ??m providing up to 14-W optical power and 50% maximum conversion efficiency. Ninety-five percent of the power is included within a wavelength range of less than 1 nm. The wavelength shift between threshold and the maximum output power is less than 3.5 nm. The wavelength stabilization is achieved with a 500-??m -long DBR containing a sixth-order Bragg grating defined by i-line wafer stepper lithography and fabricated by reactive ion etching.

Keywords

Bragg gratings; distributed Bragg reflector lasers; ion beam lithography; optical fabrication; sputter etching; DBR lasers; distributed Bragg reflector lasers; high-power broad-area lasers; i-line wafer stepper lithography; reactive ion etching; sixth-order Bragg grating; size 500 mum; size 90 mum; surface Bragg gratings; wavelength 980 nm; wavelength shift; wavelength stabilization; Bragg grating; high power; laser fabrication; semiconductor laser; wavelength stabilization;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2009.2038792

Filename

5378590