DocumentCode :
1381898
Title :
Progress Toward Externally Powered X-Band Dielectric-Loaded Accelerating Structures
Author :
Jing, Chunguang ; Gai, Wei ; Power, John G. ; Konecny, Richard ; Liu, Wanming ; Gold, Steven H. ; Kinkead, Allen K. ; Tantawi, Sami G. ; Dolgashev, Valery ; Kanareykin, Alexei
Author_Institution :
High Energy Phys. Div., Argonne Nat. Lab., Argonne, IL, USA
Volume :
38
Issue :
6
fYear :
2010
fDate :
6/1/2010 12:00:00 AM
Firstpage :
1354
Lastpage :
1360
Abstract :
We summarize recent progress in a program to develop externally powered dielectric-loaded accelerating (DLA) structures that can sustain high accelerating gradients. High-power RF tests of earlier structures showed strong multipactor loading. In addition, arcing at dielectric joints between the uniform DLA structure and matching sections at either end limited the achievable gradient. In this paper, we study the onset of multipactor in a DLA structure. We also study the effect of thin-film TiN coatings applied by atomic layer deposition and the effect of a reduction in the inner diameter of the structure. Test results of these structures show significant decreases in multipactor loading. We also test new structure designs that eliminate separate dielectric matching sections and, thus, the requirement for dielectric joints, including a DLA structure using a coaxial coupler and a clamped DLA structure. The clamped structure demonstrated a significantly improved gradient without breakdown.
Keywords :
atomic layer deposition; dielectric-loaded waveguides; electric breakdown; high-frequency discharges; linear accelerators; microwave switches; thin films; titanium compounds; TiN; X-band dielectric-loaded accelerating structure; atomic layer deposition; clamped DLA structure; coaxial coupler; dielectric joint; dielectric matching; high accelerating gradient; high-power RF test; linear accelerator; multipactor loading; structure design; thin-film TiN coating; Dielectric breakdown; dielectric-loaded accelerator; high-power RF; multipactor;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2009.2036921
Filename :
5382515
Link To Document :
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