Title :
Modeling of spin-based silicon technology
Author :
Sverdlov, Viktor ; Ghosh, Joydeb ; Mahmoudi, Hiwa ; Makarov, A. ; Osintsev, Dmitri ; Windbacher, Thomas ; Selberherr, Siegfried
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
Abstract :
Electron spin attracts much attention as an alternative degree of freedom for low-power reprogrammable logic and non-volatile memory applications. Silicon appears to be the perfect material for spin-driven applications. Recent progress and challenges in simulating spin-based devices are briefly reviewed. Strain-induced enhancement of the electron spin lifetime in silicon thin films is predicted and its impact on spin transport in SpinFETs is discussed. A new design of the spin-based nonvolatile memory cell, MRAM, is presented. By means of micromagnetic simulations it is demonstrated that the new design leads to a reduction of the switching time of the cell. Any two memory cells from a MRAM array can form an implication logic gate. It is shown how by using these gates an intrinsic non-volatile logic-in-memory architecture is realized.
Keywords :
MRAM devices; carrier lifetime; elemental semiconductors; field effect transistors; integrated circuit design; integrated circuit modelling; low-power electronics; magnetoelectronics; semiconductor thin films; silicon; MRAM array; Si; SpinFETs; degree of freedom; electron spin; electron spin lifetime; implication logic gate; intrinsic nonvolatile logic-in-memory architecture; low-power reprogrammable logic; micromagnetic simulations; silicon thin films; spin transport; spin-based devices; spin-based nonvolatile memory cell; spin-based silicon technology; strain-induced enhancement; switching time reduction; Computer architecture; Logic gates; Magnetic tunneling; Magnetization; Scattering; Silicon; Switches; SpinFET; silicon spintronics; spin based logic; spin based memory; spin transport;
Conference_Titel :
Ultimate Integration on Silicon (ULIS), 2014 15th International Conference on
Conference_Location :
Stockholm
DOI :
10.1109/ULIS.2014.6813891