DocumentCode :
138271
Title :
Challenges in suspending CVD graphene: More than capillary effects
Author :
Aydin, O.I. ; Hallam, Toby ; Thomassin, J.L. ; Mouis, M. ; Duesberg, G.
Author_Institution :
Grenoble INP, Minatec, Grenoble, France
fYear :
2014
fDate :
7-9 April 2014
Firstpage :
33
Lastpage :
36
Abstract :
It is known that the fabrication of graphene NEMS raises several technological issues. Beyond capillarity effects, the quality of the interface between graphene and resist is the most critical challenge. In this paper we propose a high yield route for the fabrication of suspended graphene structures, using technological steps compatible with large-scale fabrication. AFM and Raman characterization results are used to probe suspension, added defects and strain evolution during the process.
Keywords :
chemical vapour deposition; graphene; nanoelectromechanical devices; nanofabrication; AFM; CVD graphene; Raman characterization; capillary effects; graphene NEMS fabrication; high yield route; large-scale fabrication; probe suspension; resist; strain evolution; suspended graphene structures; Etching; Fabrication; Graphene; Hafnium; Resists; Strain; AFM; CVD Graphene; Raman spectroscopy; mechanical strain; processing technology; suspended beams;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (ULIS), 2014 15th International Conference on
Conference_Location :
Stockholm
Type :
conf
DOI :
10.1109/ULIS.2014.6813899
Filename :
6813899
Link To Document :
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