• DocumentCode
    1383456
  • Title

    New seed geometry for growth of low dislocation synthetic quartz

  • Author

    Shinohara, Armando H. ; Iano, Marcos C. ; Suzuki, Carlos K.

  • Author_Institution
    Dept. of Mech. Eng., Univ. Fed. de Pernambuco, Recife, Brazil
  • Volume
    47
  • Issue
    5
  • fYear
    2000
  • Firstpage
    1199
  • Lastpage
    1203
  • Abstract
    A method to grow low dislocation density synthetic quartz by using a special cutting seed geometry is reported. With this method, a relatively high dislocation density seed material is allowable. For such a purpose, a seed of new geometry was prepared and grown in a standard hydrothermal growth condition, long in Y-direction with multiple V-shaped notches made on Z-face. The characterization study was conducted by X-ray topography. The results showed new growth regions, equal to the numbers of V-shaped notches made in the seed and usually not found in the conventional Y- and Z-bar synthetic quartz crystals. Each new growth region is composed of two sectors of distinct textures. Soon they disappear due to their high growth velocity, and they are replaced by the so-called Z-region. However, the growth process of these new sectors grown perpendicular to the internal faces of the V-shaped notches played an important role in inhibiting the propagation of the dislocation originally present in the seed into the grown Z-region.
  • Keywords
    X-ray topography; crystal growth from solution; dislocation density; quartz; SiO/sub 2/; X-ray topography; cutting seed geometry; dislocation density; hydrothermal growth; synthetic quartz crystal; Conducting materials; Crystalline materials; Crystallization; Crystals; Etching; Ferroelectric materials; Geometry; Mechanical engineering; Solids; Surfaces;
  • fLanguage
    English
  • Journal_Title
    Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-3010
  • Type

    jour

  • DOI
    10.1109/58.869066
  • Filename
    869066